Dislocation stress memorization technique (DSMT) on epitaxial channel devices

ABSTRACT

The present disclosure relates to method of forming a transistor device having epitaxial source and drain regions with dislocation stress memorization (DSM) regions that provide stress to an epitaxial channel region, and an associated device. The method forms a first dislocation stress memorization (DSM) region and a second DSM region having stressed lattices within a substrate. The substrate is selectively etched to form a source cavity and a drain cavity extending from an upper surface of the substrate to positions contacting the first DSM region and the second DSM region. An epitaxial source is formed within the source cavity and an epitaxial drain region is formed within the drain cavity. A gate structure is formed over the substrate at a location laterally between the epitaxial source region and the epitaxial drain region.

REFERENCE TO RELATED APPLICATION

This application is a Divisional of U.S. application Ser. No. 14/252,147 filed on Apr. 14, 2014, the contents of which are incorporated by reference in their entirety.

BACKGROUND

Modern day integrated circuits comprise millions or billions of transistors devices. Transistors devices operate as switches that allow charge carriers (e.g., electrons) to flow when turned on, and which prevent charge carriers from flowing when turned off. The performance of a transistor is influenced by a charge carrier mobility of a material from which the transistor is made. Charge carrier mobility is a measure of how quickly charge carriers move though a material in the presence of an electric field. Increased charge carrier mobility can provide for faster transistor switching speeds, at a fixed voltage, or lower voltage for the same switching speed.

In recent years, strain engineering has become a widely used method of improving the performance of transistor devices. Strain engineering induces a pressure onto either a channel region and/or onto source and drain regions of a transistor device. The pressure stretches the crystalline lattice of region(s) to increase the distance between atoms beyond their normal inter-atomic distance. By stretching the crystalline lattice, strain engineering increases charge carrier mobility and thereby improves device performance.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying figures. It is noted that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion.

FIG. 1 illustrates some embodiments of a transistor device having epitaxial source and drain regions comprising dislocation stress memorization (DSM) regions configured to provide stress to an epitaxial channel region.

FIG. 2 illustrates some additional embodiments of a transistor device having epitaxial source and drain regions comprising DSM regions configured to provide stress to an epitaxial channel region.

FIG. 3 illustrates a flow diagram of some embodiments of a method of forming a transistor device having epitaxial source and drain regions comprising DSM regions configured to provide stress to an epitaxial channel region.

FIG. 4 illustrates a flow diagram of some additional embodiments of a method of forming a transistor device having epitaxial source and drain regions comprising DSM regions configured to provide stress to an epitaxial channel region.

FIGS. 5-12 illustrate some embodiments of cross-sectional views of a semiconductor substrate showing a method of forming a transistor device having epitaxial source and drain regions comprising DSM regions configured to provide stress to an epitaxial channel region

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, or examples, for implementing different features of the provided subject matter. Specific examples of components and arrangements are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to be limiting. For example, the formation of a first feature over or on a second feature in the description that follows may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which additional features may be formed between the first and second features, such that the first and second features may not be in direct contact. In addition, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The apparatus may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may likewise be interpreted accordingly.

Over the past few decades the semiconductor industry has made continual advances in manufacturing technology, which have allowed for a steady reduction in transistor device size and constant improvement in transistor device performance. However, in recent years, as scaling has begun to reach the physical limitations of materials, scaling has begun to cause a number of problems with transistor devices. For example, as transistor gate lengths continue to decrease, local and global variations of transistor threshold voltages have become worse. For example, during fabrication of an integrated chip, a plurality of separate processing operations are used to form structural features of transistor devices. Such processing operations may introduce dopant impurities into a transistor channel that may cause variations in the threshold voltages of transistor devices and therefore performance degradation. Furthermore, increasing the dose used for pocket implantations, to improve short-channel control of transistor devices, aggravates such threshold voltage variations.

Accordingly, the present disclosure relates to a transistor device having epitaxial source and drain regions comprising dislocation stress memorization (DSM) regions configured to provide stress to an epitaxial channel region, to improve transistor device performance (including short channel control of transistor devices), and an associated method of formation. The transistor device comprises an epitaxial stack disposed over a semiconductor substrate, and a gate structure disposed over the epitaxial stack. An epitaxial source region and an epitaxial drain region are disposed within the epitaxial stack and the semiconductor substrate on opposing sides of the gate structure. A channel region extends below the gate structure between the epitaxial source and drain regions. First and second dislocation stress memorization (DSM) regions respectively extend from below the epitaxial source region to a first location within the epitaxial source region and from below the epitaxial drain region to a second location within the epitaxial drain region. The first and second DSM regions comprise material of the epitaxial source and drain regions and the semiconductor substrate and have a stressed lattice configured to generate stress within the channel region, to improve device performance.

FIG. 1 illustrates some embodiments of a transistor device 100 having epitaxial source and drain regions comprising dislocation stress memorization (DSM) regions configured to provide stress to an epitaxial channel region.

The transistor device 100 comprises a semiconductor substrate 102 (e.g., a silicon substrate). An epitaxial stack 103 having one or more epitaxial layers is disposed over the semiconductor substrate 102. In some embodiments, the epitaxial stack 103 comprises a carbon doped epitaxial layer 104 disposed over the semiconductor substrate 102 and a lightly-doped epitaxial layer 106 (e.g., an epitaxial layer grown without doping, but having a low doping concentration due to back diffusion of dopants from the semiconductor substrate 102) disposed over the carbon doped epitaxial layer 104. A gate structure 114 is disposed over the lightly-doped epitaxial layer 106.

An epitaxial source region 108 a and an epitaxial drain region 108 b are disposed within the epitaxial stack 103 and semiconductor substrate 102 on opposing sides of the gate structure 114. The epitaxial source and drain regions, 108 a and 108 b, may comprise a first doping type (e.g., n-type doping for an NMOS transistor) different than a second doping type of the epitaxial layers (p-type). A channel region 109 extends between the epitaxial source region 108 a and the epitaxial drain region 108 b within the epitaxial stack 103 of the transistor device 100. In some embodiments, the epitaxial source and drain regions, 108 a and 108 b, may comprise recesses, having a diamond-shape or V-shape, which have been filled with a stress-inducing material. In some embodiments, the stress inducing material may comprise silicon phosphate (SiP) (e.g., for n-channel MOSFET channel mobility enhancement). In other embodiments, the strain inducing material may comprise other materials such as silicon germanium (SiGe), silicon carbide (SiC), etc.

A first dislocation stress memorization (DSM) region 110 a and a second DSM region 110 b are disposed on opposing sides of the gate structure 114. The first and second DSM regions, 110 a and 110 b, comprise a re-crystallized amorphous material. The re-crystallized amorphous material of the first and second DSM regions, 110 a and 110 b, comprises stacking defects, 111 a and 111 b, along a (111) plane. The stacking defects, 111 a and 111 b, which can be detected by electron microscopy (e.g., TEM), distort the bond length of the lattice within the first and second DSM regions, 110 a and 110 b. For example, the stacking defects, 111 a and 111 b, may cause the first and second DSM regions, 110 a and 110 b, to have a stressed lattice with a smaller distance between atoms than normal.

The stressed lattices of the first and second DSM regions, 110 a and 110 b, are configured to induce a stress on the channel region 109, which increases charge carrier mobility and improves short channel effects of the transistor device 100. The first and second DSM regions, 110 a and 110 b, are also configured to stress a portion of the epitaxial source and drain regions, 108 a and 108 b, and a portion of the underlying semiconductor substrate 102 (i.e., the first and second DSM regions, 110 a and 110 b, comprise a semiconductor substrate material having a strained (i.e., re-crystallized) lattice and a source/drain epitaxial material having a strained lattice). In some embodiments, the stressed portion of the semiconductor substrate 102, underlying the source and drain regions, 108 and 108 b, may comprise a stress inducing dopant, such as germanium, for example. In some embodiments, the first DSM region 110 a may extend from a location below the epitaxial source region 108 a to a recessed source contact 112 a located along a top surface of the epitaxial source region 108 a. Similarly, the second DSM region 110 b may extend from a location below the epitaxial drain region 108 b to a recessed drain contact 112 b located along a top surface of the epitaxial drain region 108 b.

FIG. 2 illustrates some additional embodiments of a transistor device 200 having epitaxial source and drain regions comprising DSM regions configured to provide stress to an epitaxial channel region.

Transistor device 200 comprises a carbon doped epitaxial layer 104 disposed over a semiconductor substrate 102 and a lightly-doped epitaxial layer 106 disposed over the carbon doped epitaxial layer 104. The carbon doped epitaxial layer 104 is configured to augment performance of the transistor device 200 (e.g., to improve local and global threshold voltage and drive current variations within the device) by mitigating dopant back diffusion from the semiconductor substrate 102 and to thereby generate a steep retrograde doping concentration profile of a channel region of transistor device 200. In some embodiments, the carbon doped epitaxial layer 104 may have a carbon doping concentration of less than 1%. In some embodiments, the retrograde doping concentration profile may provide for a doping concentration that is less than 1e18 cm⁻³ at an interface between the lightly-doped epitaxial layer 106 and the gate structure 114.

First and second DSM regions, 110 a and 110 b, extend along a vertical direction from a location below epitaxial source and drain regions, 108 a and 108 b, to recessed source and drain contacts, 112 a and 112 b, located along a top surface of the epitaxial source and drain regions, 108 a and 108 b, respectively. In some embodiments, the recessed source and drain contacts, 112 a and 112 b, may comprise nickel. In some embodiments, top surfaces of the DSM regions, 110 a and 110 b, may have a divot or recess comprising the recessed source and drain contacts, 112 a and 112 b. In some embodiments, the first and second DSM regions, 110 a and 110 b, may have a bottom surface that is located at distance 202 below the epitaxial source and drain regions, 108 a and 108 b, respectively. For example, the first and second DSM regions, 110 a and 110 b, may extend to a distance 202 of greater than or equal to approximately 2 nm below the epitaxial source and drain regions, 108 a and 108 b. In some embodiments, a height 204 of the epitaxial stack 103 is less than a height 206 of the first and second DSM regions, 110 a and 110 b.

The first and second DSM regions, 110 a and 110 b, extend along a lateral direction from a first position within the epitaxial source and drain regions, 108 a and 108 b, to a second position within the epitaxial regions, 108 a and 108 b. In some embodiments, the first and second positions are selected so that the DSM regions, 110 a and 110 b, have a smaller width than the epitaxial source and drain regions, 108 a and 108 b. In some embodiments, the first and second DSM regions, 110 a and 110 b, may be laterally separated from the gate structure 112 by a relatively small distance 208 so as to enhance stress on the channel region. For example, the first or second DSM regions, 110 a or 110 b, may be separated from the gate structure by a distance 208 that is less than approximately 10 nm.

In some embodiments, the gate structure 114 may comprise a stacked gate dielectric layer 210 and a gate electrode layer 212. The gate dielectric layer 210 (e.g., a silicon dioxide layer, a high-k dielectric layer, etc.) is disposed onto the lightly-doped epitaxial layer 106. The gate electrode layer 212 (e.g., a poly-silicon layer, a replacement metal gate layer, etc.) is disposed onto the gate dielectric layer 210. In some embodiments, the gate dielectric layer 210 and a gate electrode layer 212 may be flanked by sidewall spacers 214. In some embodiments, the sidewall spacers 214 may comprise nitride spacers.

FIG. 3 illustrates a flow diagram of some embodiments of a method 300 of forming a transistor device having epitaxial source and drain regions comprising DSM regions configured to provide stress to an epitaxial channel region.

At 302, a semiconductor substrate is provided. The semiconductor substrate may comprise an intrinsically doped semiconductor substrate having a first doping type (e.g., an n-type doping or a p-type doping).

At 304, the semiconductor substrate is selectively etched to form a recess within the semiconductor substrate.

At 306, an epitaxial growth process is performed to form an epitaxial stack within the recess. In some embodiments, the epitaxial stack may comprise a carbon doped epitaxial layer (e.g., SiC) and an un-doped epitaxial layer (e.g., silicon). The carbon doped epitaxial layer may be epitaxially grown onto a bottom surface of the recess, while the un-doped epitaxial layer may be epitaxially grown onto the carbon doped epitaxial layer. The carbon doped epitaxial layer is configured to mitigate back diffusion of dopants from the semiconductor substrate to form a steep retrograde doping profile within a channel region which results in a relatively low surface dopant concentration (e.g., less than 1e18 cm⁻³) that improves threshold voltage and drive current variations.

At 308, a dislocation stress memorization technique (DSMT) is performed to form dislocation stress memorization (DSM) regions within the epitaxial stack and the semiconductor substrate at positions corresponding to source and drain regions of the transistor device. In some embodiments, the DSM regions may have a stressed lattice that has a smaller distance between atoms than normal (i.e., the lattice constant of the DSM region is smaller than the natural lattice constant not being stressed). In other embodiments, the DSM regions may have a stressed lattice that has a larger distance between atoms than normal.

At 310, source and drain regions are formed within the semiconductor substrate at positions that abut a portion of the DSM regions. In some embodiments, the source and drain regions comprise epitaxial source and drain regions. In such embodiments, the epitaxial source and drain regions may be formed by selectively etching the semiconductor substrate to form source and drain cavities abutting a portion of the DSM regions, at 312. In some embodiments, the cavities may comprise a portion of the DSM regions. Epitaxial material is then deposited within the source and drain cavities onto the portion of the DSM regions, at 314. Since the epitaxial material is grown onto a portion of the DSM regions, the epitaxial material will have a stressed lattice due to the stressed lattice of the DSM regions, thereby causing the DSM regions to extend from the semiconductor substrate to the epitaxial source and drain regions.

FIG. 4 illustrates a flow diagram of some additional embodiments of a method 400 of forming a transistor device having epitaxial source and drain regions comprising DSM regions configured to provide stress to an epitaxial channel region.

While disclosed methods (e.g., methods 300 and 400) are illustrated and described below as a series of acts or events, it will be appreciated that the illustrated ordering of such acts or events are not to be interpreted in a limiting sense. For example, some acts may occur in different orders and/or concurrently with other acts or events apart from those illustrated and/or described herein. In addition, not all illustrated acts may be required to implement one or more aspects or embodiments of the description herein. Further, one or more of the acts depicted herein may be carried out in one or more separate acts and/or phases.

At 402, a semiconductor substrate is provided. In various embodiments, the semiconductor substrate may comprise any type of semiconductor body (e.g., silicon, silicon-germanium, silicon-on-insulator, etc.) such as a semiconductor wafer and/or one or more die on a semiconductor wafer, as well as any other type of semiconductor and/or epitaxial layers associated therewith.

At 404, a well/V_(t) implantation process is performed to introduce dopants into the semiconductor substrate. In some embodiments, a well anneal process may be performed on the semiconductor substrate after the well/Vt implantation process to activate dopants introduced by the well/V_(t) implantation process.

At 406, the semiconductor substrate is selectively etched to form a recess within the well region along a top surface of the semiconductor substrate.

At 408, an epitaxial growth process is performed to grow one or more epitaxial layers within the recess. In some embodiments, the one or more epitaxial layers may comprise a carbon doped epitaxial layer and an overlying un-doped epitaxial layer having no dopants (i.e., having an intrinsic doping concentration of approximately 1e15 cm⁻³).

At 410, a dummy gate structure is formed over the one or more epitaxial layers.

At 412, an LDD (lightly doped drain) and/or halo implantation process is performed. The LDD/halo implantation process introduces dopants into the semiconductor substrate.

At 414, a dislocation stress memorization technique (DSMT) is performed to form DSM regions on opposing sides of the dummy gate structure. In some embodiments, the DSM regions may have a stressed lattice that has a smaller distance between atoms than normal (i.e., the lattice constant of the DSM region is smaller than the natural lattice constant not being stressed). In other embodiments, the DSM regions may have a stressed lattice that has a larger distance between atoms than normal.

In some embodiments, the DSMT may be performed by selectively implanting a stress inducing dopant into the one or more epitaxial layers and the underlying semiconductor substrate to form implantation regions at positions corresponding to source and drain regions of the transistor device, at 416. A DSMT capping layer is formed over the implantation regions, at 418. A high temperature anneal is performed, at 420. The high temperature anneal causes the DSMT capping layer to form a re-crystallized amorphous material having stacking defects along (111) planes. The stacking defects induce a stress in the implantation regions, thereby forming the DSM regions. At 422, the DSMT capping layer is removed.

At 424, the one or more epitaxial layers and the underlying semiconductor substrate are selectively etched to form source and drain cavities. The selectively etch removes a portion of the DSM regions (formed at act 414), such that a bottom surface of the source and drain cavities abuts the DSM regions.

At 426, epitaxial material (e.g., silicon phosphate) is formed within the source and drain cavities to form an epitaxial source region and an epitaxial drain region. Since the epitaxial material is grown onto a portion of the DSM regions, the epitaxial material will have a stressed lattice due to the stressed lattice of the DSM regions, thereby causing the stacking defects of the re-crystallized amorphous to extend along (111) planes to positions within the epitaxial source and drain regions.

At 428, a replacement gate process is performed to replace the dummy gate structure with a gate dielectric layer and an overlying replacement metal gate electrode layer. In various embodiments, the dummy gate structure may be removed by a wet etching process and/or a dry etching process. In various embodiments, the gate dielectric layer may comprise an inter-layer gate dielectric layer or a high-k gate dielectric layer formed by a deposition technique.

At 430, recessed source and drain contacts are formed within the epitaxial source and drain regions, respectively. The stacking defects may extend to a position abutting the recessed source and drain contacts.

FIGS. 5-12 illustrate some embodiments of cross-sectional views of a semiconductor substrate showing a method of forming a transistor device having epitaxial source and drain regions comprising DSM regions configured to provide stress to an epitaxial channel region. Although FIGS. 5-12 are described in relation to method 400, it will be appreciated that the structures disclosed in FIGS. 5-12 are not limited to such a method.

FIG. 5 illustrates a cross-sectional view 500 of some embodiments of a semiconductor substrate corresponding to acts 402-404.

As shown in cross-sectional view 500, a voltage threshold (V_(t))/well implantation 502 is performed on the semiconductor substrate 504. The V_(t)/well implantation 502 is configured to introduce dopants 506 into the semiconductor substrate 504 to adjust the V_(t) (threshold voltage) applied to a transistor to allow current to flow in a channel region. In some embodiments, the V_(t)/well implantation 502 may introduce a p-type dopant (e.g., boron) into the semiconductor substrate 504, while in other embodiments the V_(t)/well implantation 502 may introduce an n-type dopant (e.g., phosphorous, antimony, or arsenic) into the semiconductor substrate 504.

In some embodiments, a well anneal process may be subsequently performed to activate the implanted dopants 506 introduce by the V_(t)/well implantation 502. The well anneal process is performed by exposing the semiconductor substrate 504 to an elevated temperature (e.g., greater than or equal to 400° C.). The well anneal process may also cure crystalline defects and/or cause diffusion and redistribution of dopant impurities to drive the implanted dopants 506 deeper into the semiconductor substrate 504 to from a well region.

FIG. 6 illustrates a cross-sectional view 600 of some embodiments of a semiconductor substrate corresponding to act 406.

As shown in cross-sectional view 600, the semiconductor substrate 504 is exposed to an etchant 602 that is configured to form a recess 604 within the semiconductor substrate 504 (i.e., to reduce the thickness of a portion of the semiconductor substrate 504). In some embodiments, the etchant 602 is configured to remove a thickness t_(eb) of a portion of the semiconductor substrate 504 that is between approximately 5 nm and approximately 30 nm, for example. In some embodiments, the etchant 602 may comprise a dry etchant (e.g., an ion bombardment) and/or a wet etchant (e.g., Tetramethylammonium hydroxide (TMAH), potassium hydroxide (KOH), etc.).

FIG. 7 illustrates a cross-sectional view 700 of some embodiments of a semiconductor substrate corresponding to act 408.

As shown in cross-sectional view 700, a carbon doped epitaxial layer 104 (e.g., silicon carbide (SiC) layer) is epitaxially grown within the recess 604 at a position overlying the semiconductor substrate 504. An un-doped epitaxial layer 702 (e.g., an un-doped silicon layer) is epitaxially grown within the recess 604 at a position overlying the carbon doped epitaxial layer 104. In some embodiments, the carbon doped epitaxial layer 104 may be grown to a thickness having a range of between approximately 2 nm and approximately 15 nm, and the un-doped epitaxial layer 702 may be grown to a thickness of between approximately 5 nm and approximately 30 nm. In some embodiments, the carbon doped epitaxial layer 104 may have a carbon concentration of approximately less than 1%. Such a carbon concentration allows for the carbon doped epitaxial layer 104 to be subsequently etched (e.g., in act 422).

In some embodiments, an oxidation process may subsequently be performed after formation of the carbon doped epitaxial layer 104 and the un-doped epitaxial layer 702 to form a thin oxide on a top surface of the un-doped epitaxial layer 702. The oxidation process comprises a high temperature anneal, which may cause back diffusion of dopants from the well region to the carbon doped epitaxial layer 104 and the un-doped epitaxial layer 702. Back diffusion of dopants into the un-doped epitaxial layer 702 causes the un-doped silicon layer to form a lightly doped epitaxial layer 106.

FIG. 8 illustrates a cross-sectional view 800 of some embodiments of a semiconductor substrate corresponding to act 410.

As shown in cross-sectional view 800, a dummy gate structure 802 is formed over the lightly-doped epitaxial layer 106. In some embodiments, the dummy gate structure 802 may comprise a polysilicon layer deposited onto the lightly-doped epitaxial layer 106 using a deposition technique (e.g., chemical vapor deposition, physical vapor deposition, etc.). Sidewall spacers 804 may be formed on the outer sidewalls of the dummy gate structure 802. In some embodiments, the sidewall spacers 804 may be formed by depositing nitride onto the lightly-doped epitaxial layer 106 and selectively etching the nitride to form the sidewall spacers 804.

FIG. 9 illustrates a cross-sectional view 900 of some embodiments of a semiconductor substrate corresponding to act 412.

As shown in cross-sectional view 900, an LDD and/or halo implantation 902 is performed. The LDD and/or halo implantation 902 introduces dopants through an upper surface of the lightly-doped epitaxial layer 106. The LDD implantation is configured to form LDD impurity regions, 904 and 906, having a doping type that is different than that of well/V_(t) implantation. The halo implantation is configured to form halo implantation regions, 908 and 910, having an opposite doping type as the LDD implantation into the periphery, but not the central portion, of a channel region. In some embodiments, the halo implantation 902 may be performed at a tilt angle Φ with respect to a top surface of the lightly-doped epitaxial layer 106. In some embodiments, the tilt angle Φ may be 20° or less. Although cross-sectional view 900 illustrates the halo implantation as being performed prior to the formation of source and drain regions (e.g., regions 108 a and 108 b), it will be appreciated that in alternative embodiments the halo implantation may be performed after formation of the source and drain regions.

FIG. 10A-10C illustrates cross-sectional views of some embodiments of a semiconductor substrate corresponding to act 414.

As shown in cross-sectional view 1000 of FIG. 10A, an implantation 1002 is performed to form amorphous regions 1004. The amorphous regions 1004 extend from a top surface of the epitaxial stack 103 to a position within the semiconductor substrate 504 underlying the epitaxial stack 103, so that a height of the amorphous regions 1004 is greater than a height of the epitaxial stack 103. In some embodiments, the implantation 1002 may be configured to implant a dopant species comprising germanium. In some embodiments, the implantation 1002 may be configured to implant a low temperature germanium pre-amorphous implant at an implant dose less than approximately 2e15. In some embodiments, the temperature germanium pre-amorphous implant may cool the germanium dopant species to a temperature of between −50° C. and −200° C. prior to implantation 1002.

As shown in cross-sectional view 1006 of FIG. 10B, a DSMT cap layer 1008 (e.g., a nitride layer) is formed over the amorphous regions 1004. A high temperature anneal 1010 is then performed. During the high temperature anneal 1010 the lattice of the amorphous regions 1004 are re-crystallized. The growth of the re-crystallized lattice will occur under stress conditions induced by the DSMT cap layer 1008 and result in re-crystallized amorphous regions 1012. The re-crystallized amorphous regions 1012 comprise a stacking defect 1014 along a (111) plane. The stacking defect 1014 distorts the lattice of the amorphous regions 1004 thereby affecting bond length. For example, a compressive capping layer may induce a stacking defect that distorts the lattice of the amorphous regions to form a smaller bonding length leading to tensile stress.

As shown in cross-sectional view 1014 of FIG. 10C, the DSMT cap layer 1008 is removed. Since the re-crystallized regions 1012 memorize the stress induced by the DSMT cap layer 1008, when the DSMT cap layer 1008 is removed the re-crystallized regions 1012 maintain their stressed lattice configurations.

FIGS. 11A-11B illustrates a cross-sectional view 1100 of some embodiments of a semiconductor substrate corresponding to acts 424-426.

As shown in cross-sectional view 1100 of FIG. 11A, an etchant 1102 is configured to selectively form a source cavity 1104 a and a drain cavity 1104 b. The source and drain cavities, 1104 a and 1104 b, extend from a top surface of the epitaxial stack 103 to a position above the bottom surface of the re-crystallized regions 1012. For example, in some embodiments, the source and drain cavities, 1104 a and 1104 b, may extend from a top surface of the epitaxial stack 103 to a position approximately greater than or equal to approximately 2 nm above the bottom surface of the re-crystallized regions 1012.

In some embodiments, the etchant 1102 may comprise a multi-step etching process. For example, a first etching process may be used to form cavities comprising a U-shaped etch profile. In some embodiments, the first etching process may comprise a dry etch, wet etch, plasma etch, RIE etch, or a combination thereof. A second, anisotropic etch process may be subsequently performed on the cavities. In some embodiments, the anisotropic etch comprises a wet etch which utilizes TMAH as an etchant configured for preferred etch selectivity in the <100> direction of the Si or SOI substrate. The resultant etch profile of the source and drain cavities, other than the bottom surface, comprises a (100) crystal orientation after the anisotropic etch.

As shown in cross-sectional view 1106 of FIG. 11B, a stress-inducing material is epitaxially deposited within the source and drain cavities, 1104 a and 1104 b, to form epitaxial source and drain regions, 108 a and 108 b. In some embodiments, the stress inducing material may comprise silicon phosphate (SiP). In other embodiments, the stress-inducing material may comprise other materials (e.g., SiGe or a carbon-containing material such as SiC). The stacking defects 1108 along the (111) planes extend into the epitaxial source and drain regions, 108 a and 108 b, to form DSM regions, 110 a and 110 b, since the stress-inducing material is epitaxial grown onto the underlying re-crystallized regions 1012, which have strained lattice due to the DSMT process (act 414).

FIG. 12 illustrates a cross-sectional view 1200 of some embodiments of a semiconductor substrate corresponding to acts 428-430.

As shown in cross-sectional view 1200, a replacement gate process is performed. The replacement gate process removes the dummy gate structure 802 and forms an inter-layer gate dielectric layer or a high-k gate dielectric layer 1202 at a position replacing the dummy gate structure 802 (i.e., between sidewall spacers 804) using a deposition technique (e.g., chemical vapor deposition, physical vapor deposition, etc.). A replacement metal gate electrode layer 1204 is deposited over gate dielectric layer 1202 using a deposition technique. In some embodiments, the replacement metal gate electrode layer 1204 may comprise aluminum, for example.

Recessed source and drain contacts, 112 a and 112 b, are respectively formed within the epitaxial source and drain regions, 108 a and 108 b. The recessed source and drain contacts, 112 a and 112 b, may be formed by selectively etching the epitaxial source and drain regions, 108 a and 108 b, and then depositing a contact material using a deposition technique. In some embodiments, the recessed source and drain contacts, 112 a and 112 b, may comprise nickel. In some embodiments, etching the epitaxial source and drain regions, 108 a and 108 b, to form the recessed source and drain contacts, 112 a and 112 b, will remove a section of the DSM regions, 110 a and 110 b. For example, in some embodiments, top surfaces of the DSM regions, 110 a and 110 b, may have a divot or recess comprising the recessed source and drain contacts, 112 a and 112 b.

Therefore, the present disclosure relates to a transistor device having epitaxial source and drain regions comprising dislocation stress memorization (DSM) regions configured to provide stress to an epitaxial channel region, and an associated method of formation.

In some embodiments, the present disclosure relates to a method of forming a transistor device. The method comprises forming a first dislocation stress memorization (DSM) region and a second DSM region having stressed lattices within a substrate. The method further comprises selectively etching the substrate to form a source cavity and a drain cavity extending from an upper surface of the substrate to positions contacting the first DSM region and the second DSM region, and forming an epitaxial source region within the source cavity and forming an epitaxial drain region within the drain cavity. The method further comprises forming a gate structure over the substrate at a location laterally between the epitaxial source region and the epitaxial drain region.

In other embodiments, the present disclosure relates to a method of forming a transistor device. The method comprises selectively etching a semiconductor substrate to form a recess along a top surface of the semiconductor substrate, and performing an epitaxial growth process to form an epitaxial stack having one or more epitaxial layers within the recess. The method further comprises performing a dislocation stress memorization technique (DSMT) to form a first dislocation stress memorization (DSM) region and a second DSM region. The method further comprises forming a source region and a drain region, wherein the first DSM region extends from below the source region to a first location within the source region and wherein the second DSM region extends from below the drain region to a second location within the drain region. The first DSM region and the second DSM region are configured to provide stress to a channel region laterally arranged between the source region and the drain region.

In yet other embodiments, the present disclosure relates to a method of forming a transistor device. The method comprises performing an epitaxial growth process to form a first epitaxial layer and an overlying second epitaxial layer over a substrate. The method further comprises performing a dislocation stress memorization technique (DSMT) to form a first stacking defect and a second stacking defect vertically extending through the first epitaxial layer and the second epitaxial layer. The method further comprises selectively etching the first epitaxial layer, the second epitaxial layer, and the substrate to form a source cavity over the first stacking defect and a drain cavity over the second stacking defect, and forming an epitaxial source region within the source cavity and an epitaxial drain region within the drain cavity. The method further comprises forming a gate structure over the substrate at a location laterally between the source region and the drain region.

The foregoing outlines features of several embodiments so that those skilled in the art may better understand the aspects of the present disclosure. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments introduced herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they may make various changes, substitutions, and alterations herein without departing from the spirit and scope of the present disclosure. 

What is claimed is:
 1. A method of forming a transistor device, comprising: forming a first dislocation stress memorization (DSM) region and a second DSM region having stressed lattices within a substrate; selectively etching the substrate to form a source cavity and a drain cavity extending from an upper surface of the substrate to positions contacting the first DSM region and the second DSM region; forming an epitaxial source region within the source cavity and forming an epitaxial drain region within the drain cavity; and forming a gate structure over the substrate at a location laterally between the epitaxial source region and the epitaxial drain region.
 2. The method of claim 1, wherein forming the first DSM region and the second DSM region comprises: selectively implanting a stress inducing dopant into the substrate to form amorphous regions; forming a DSMT capping layer over the amorphous regions; performing a high temperature anneal, wherein the DSMT capping layer induces a stress in presence of the high temperature anneal, which causes a lattice of the amorphous regions to be re-crystallized to form re-crystallized amorphous regions; and removing the DSMT capping layer.
 3. The method of claim 2, wherein the re-crystallized amorphous regions respectively comprise a stacking defect.
 4. The method of claim 1, wherein the first DSM region and the second DSM region have a smaller width than the epitaxial source region and the epitaxial drain region.
 5. The method of claim 1, wherein the first DSM region extends from below the epitaxial source region to a first location within the epitaxial source region and wherein the second DSM region extends from below the epitaxial drain region to a second location within the epitaxial drain region.
 6. The method of claim 5, further comprising: forming a recessed source contact extending from a top surface of the epitaxial source region to a position within the first DSM region underlying the top surface of the epitaxial source region; and forming a recessed drain contact extending from a top surface of the epitaxial drain region to a position within the second DSM region underlying the top surface of the epitaxial drain region.
 7. The method of claim 1, wherein the first DSM region and the second DSM region are laterally separated from sidewall spacers of the gate structure by a non-zero distance.
 8. A method of forming a transistor device, comprising: selectively etching a semiconductor substrate to form a recess along a top surface of the semiconductor substrate; performing an epitaxial growth process to form an epitaxial stack having one or more epitaxial layers within the recess; performing a dislocation stress memorization technique (DSMT) to form a first dislocation stress memorization (DSM) region and a second DSM region; forming a source region and a drain region, wherein the first DSM region extends from below the source region to a first location within the source region and wherein the second DSM region extends from below the drain region to a second location within the drain region; and wherein the first DSM region and the second DSM region are configured to provide stress to a channel region laterally arranged between the source region and the drain region.
 9. The method of claim 8, wherein performing the DSMT comprises: selectively implanting a stress inducing dopant into the one or more epitaxial layers and the semiconductor substrate to form amorphous regions; forming a DSMT capping layer over the amorphous regions; performing a high temperature anneal, wherein the DSMT capping layer induces a stress in presence of the high temperature anneal, which causes a lattice of the amorphous regions to be re-crystallized; and removing the DSMT capping layer.
 10. The method of claim 8, further comprising: performing a first implantation to implant dopants into the semiconductor substrate to form a well region prior to selectively etching the semiconductor substrate to form the recess, wherein the well region is arranged below the epitaxial stack.
 11. The method of claim 8, wherein forming the source region and the drain region comprises: selectively etching the one or more epitaxial layers and the semiconductor substrate to form source and drain cavities abutting the first DSM region and the second DSM region; and depositing an epitaxial material within the source and drain cavities.
 12. The method of claim 8, wherein a height of the epitaxial stack is less than a height of the first DSM region and the second DSM region.
 13. The method of claim 8, wherein the epitaxial stack comprises: a carbon doped epitaxial layer having a carbon content of approximately 1% disposed over the semiconductor substrate; and a lightly-doped epitaxial layer disposed over the carbon doped epitaxial layer.
 14. The method of claim 13, wherein the first DSM region and the second DSM region vertically extend through the carbon doped epitaxial layer.
 15. A method of forming a transistor device, comprising: performing an epitaxial growth process to form a first epitaxial layer and an overlying second epitaxial layer over a substrate; performing a dislocation stress memorization technique (DSMT) to form a first stacking defect and a second stacking defect vertically extending through the first epitaxial layer and the second epitaxial layer; selectively etching the first epitaxial layer, the second epitaxial layer, and the substrate to form a source cavity over the first stacking defect and a drain cavity over the second stacking defect; forming an epitaxial source region within the source cavity and an epitaxial drain region within the drain cavity; and forming a gate structure over the substrate at a location laterally between the epitaxial source region and the epitaxial drain region.
 16. The method of claim 15, wherein performing the DSMT comprises: selectively implanting a stress inducing dopant to form amorphous regions within the first epitaxial layer, the second epitaxial layer, and the substrate; forming a DSMT capping layer over the amorphous regions; performing a high temperature anneal, wherein the DSMT capping layer induces a stress in presence of the high temperature anneal, which causes a lattice of the amorphous regions to be re-crystallized to form the first stacking defect and the second stacking defect; and removing the DSMT capping layer.
 17. The method of claim 15, further comprising: performing an implantation to form lightly doped drain (LDD) impurity regions within an upper surface of the substrate, wherein the LDD impurity regions are laterally arranged between the epitaxial source region and the epitaxial drain region.
 18. The method of claim 15, wherein a sum of heights of the first epitaxial layer and the second epitaxial layer is less than a height of the first stacking defect or the second stacking defect.
 19. The method of claim 15, wherein the first stacking defect and the second stacking defect have a smaller width than the epitaxial source region and the epitaxial drain region.
 20. The method of claim 15, wherein the first stacking defect and the second stacking defect are laterally separated from sidewall spacers of the gate structure by a non-zero distance. 